ʻO ka Ellipsometer Spectroscopic Precision Kiʻekiʻe | ʻŌnaehana Ana ʻĀpana Lahilahi ʻAʻole Luku a me ka ʻŌnaehana Ana ʻĪnā Refractive

Nā noi

Hoʻohana nui ʻia kēia ʻōnaehana i ka hana semiconductor, ka uhi optical, nā hōʻikeʻike panela pālahalaha, ka hoʻomohala ʻana i ka photovoltaic (cell solar), ka noiʻi ʻepekema mea, a me ka biosensing.

No ke aha e koho ai i kā mākou hoʻonā

Ma ke ʻano he mea hana ʻoihana me nā hiki R&D ikaika, hāʻawi mākou i nā kumukūʻai pololei mai ka hale hana, nā hoʻonohonoho hiki ke hoʻopilikino ʻia, a me ke kākoʻo loea i hoʻolaʻa ʻia. Inā makemake ʻoe i kahi ʻōnaehana benchtop no ka nānā ʻana i ka hale hana a i ʻole kahi hopena in-line no ka nānā ʻana i ka hana ʻana, hiki iā mākou ke hoʻopilikino i ka mea kani i kāu mau pono ana kikoʻī.

E noi i kahi ʻōlelo kūʻai

E leka uila mai iā mākou i kēia lā e kūkākūkā i kāu noi a i ʻole e noi i kahi ʻōlelo kūʻai. Hāʻawi kā mākou hui i nā kūkākūkā loea manuahi e kōkua iā ʻoe e koho i ka hopena ana ʻili lahilahi kūpono loa.

Nā Kūlana ʻenehana Nui

1. Nā Hiki Ana: nā mea matrix Mueller kauoha 16, ka polarization spectrum Psi/Delta, ka refractive index, ka mānoanoa, ka birefringence, a me ka dielectric constant, a pēlā aku.

2. Ka laulā o ka Spectral: 210nm-1690nm

3. Ka mamao o ka nalu: ≤0.8nm@210-1000nm, ≤3.5nm@1000-1690nm

4. Manawa Ana Hoʻokahi-kiko: ≤10s

5. Ka nui o ka micro-spot: ≤200μm

6. ʻenehana hoʻololi: ʻōnaehana hoʻololi ʻōnaehana hoʻopihapiha wili pālua PCSCA

7. Kahua Laʻana Akomi: Z-axis e kālele ana i ka nānā pono ʻana, ka huakaʻi kiʻekiʻe loa he 18mm, ka pae liʻiliʻi loa he 1µm

8. Ka pololei o ka hana hou ʻana o ka mānoanoa o ke kiʻiʻoniʻoni: ≤0.005nm (100nm SiO2/Si, 30 mau ana hou, i helu ʻia e like me 1σ)

9. Ka pololei o ka hana hou ʻana o ka helu refractive: ≤0.0002 (100nm SiO2/Si, 30 mau ana hou, i helu ʻia e like me 1σ)

10. Ka pololei o ka mānoanoa o ke kiʻiʻoniʻoni: ≤0.5% (100nm SiO2/Si, hōʻike metrology ʻaoʻao ʻekolu i hāʻawi ʻia)

11. Hana palapala ʻāina: Hoʻohana i kahi kahua scan ʻakomi ʻano x/y kiʻekiʻe kiʻekiʻe, kākoʻo i ke kūlana ʻakomi a me ke ana ʻana o ka scan o nā substrates 2/4/6/8-'īniha, pololei hana hou ≤6μm, hanauna hoʻokahi-kaomi o nā palapala hoʻolaha mānoanoa kiʻiʻoniʻoni 2D/3D

12. Ka laulā ʻana o ka laser a me ka nānā ʻana: Ke kau ʻana i ka lōʻihi o ke kikowaena ma o ke ala optical reflection laser, e kālele ana i ka huakaʻi ≤3mm

13. Kumu hoʻohālike ʻokoʻa: Hoʻomaulia ponoʻī i ka ʻikepili ʻokoʻa psi-diff a me delta-diff

14. Polokalamu loiloi: Loaʻa iā ia ma ka liʻiliʻi he 5 mau ʻano ana like ʻole, kahi waihona ʻikepili n/k i kūkulu ʻia no nā mea optical he 100 a ʻoi, a kākoʻo i ka hana ʻana i nā waihona ʻikepili maʻamau; loaʻa iā ia nā hiki ke hoʻāʻo a me ke ʻano loiloi no ka papa hoʻokahi, papa he nui (a hiki i 30 mau papa), a me nā ʻiliʻili lahilahi hui pū ʻia, me nā hiʻohiʻona cauchy, Sellmeier, Tauc-Lorentz, Bspline, a me Oscillator, a kākoʻo i ka laikini polokalamu offline.

Nā Kikoʻī ʻenehana

I. Hoʻolauna Lako Hana

Hoʻohana ka ME-Mapping Spectroellipsometry i ka ʻenehana modulation compensator dual-rotation i hui pū ʻia me nā algorithms loiloi ʻikepili kiʻekiʻe. Hiki iā ia ke loaʻa nā mea 16 āpau o ka matrix Mueller piha a me ka polarization spectrum i hoʻokahi ana, e hiki ai ke ana wikiwiki a me ka luku ʻole i ka laʻana. Hoʻohanohano ka mea hana i kahi hoʻolālā ala optical paʻa a hoʻohana i kahi mea ʻike semiconductor-cooled, e loaʻa ana nā hōʻailona ikaika māmā i loko o kekona. Hāʻawi ia i ka wikiwiki ana wikiwiki a me ka pololei kiʻekiʻe, e kākoʻo ana i ke ana pololei o nā palena e like me ka mānoanoa, ka helu refractive, ka coefficient extinction, a me ka optical dielectric constant no nā mea ʻili lahilahi like ʻole. Eia kekahi, hiki ke hoʻopilikino ʻia me nā "wafer repeatable positioning stages" like ʻole no nā ana scanning multi-point mapping o nā laʻana nui like ʻole.